Title:
クリームおよびその製造方法
Document Type and Number:
Japanese Patent JP6694118
Kind Code:
B2
Abstract:
Provided are: a cream that contains a high percentage of hydrogen gas and has few harmful effects on the skin; and a manufacturing method therefor. The cream according to the present invention is one in which bubble-state hydrogen gas is incorporated into a composition that comprises a fatty acid salt having 10 or more carbon atoms, a fatty acid having 10 or more carbon atoms, and a liquid medium, wherein the content percentage of the bubble-state hydrogen gas with respect to the cream is 0.1-100 vol% [v/w]. The cream manufacturing method according to the present invention comprises: preparing a composition that comprises a fatty acid salt having 10 or more carbon atoms, a fatty acid having 10 or more carbon atoms, and a liquid medium; incorporating bubble-state hydrogen gas into the composition; and increasing the viscosity of the composition containing the bubble-state hydrogen gas.
Inventors:
Yu Shibahara
Ken Toyonaga
Nishio Daisuke
Koichi Toyoshima
Takeda Toru
Ken Toyonaga
Nishio Daisuke
Koichi Toyoshima
Takeda Toru
Application Number:
JP2019546672A
Publication Date:
May 13, 2020
Filing Date:
September 28, 2018
Export Citation:
Assignee:
Shinryo Corporation
International Classes:
A61K8/19; A61K8/06; A61K8/31; A61K8/34; A61K8/36; A61Q19/00
Domestic Patent References:
| JP2007308467A | ||||
| JP2015113331A | ||||
| JP2016108291A | ||||
| JP2014062087A | ||||
| JP2005289994A |
Attorney, Agent or Firm:
Field Saki Satoshi
Shunsuke Fushimi
Kazunori Onami
Shunsuke Fushimi
Kazunori Onami