Title:
反応処理装置
Document Type and Number:
Japanese Patent JP6694120
Kind Code:
B2
Abstract:
A reaction processing apparatus 100 includes: a reaction processing vessel 10 including a channel 12, a first air communication port 24, and a second air communication port 26; a temperature control system 102 that provides a low temperature region 38 and a high temperature region 36 in the channel 12; and a liquid feeding system 120 that moves a sample 50 inside the channel 12. The liquid feeding system 120 includes: a pump 121 having a discharge port 121a; a first air channel 129 that connects the discharge port 121a and the first air communication port 24; a second air channel 130 that connects the discharge port 121a and the second air communication port 26; a first three-way valve 123 capable of being switched between a state in which the first air communication port 24 communicates with the discharge port 121a and a state in which the first air communication port 24 is opened to the atmospheric pressure; a second three-way valve 124 capable of being switched between a state in which the second air communication port 26 communicates with the discharge port 121a and a state in which the second air communication port 26 is opened to the atmospheric pressure; and a CPU 105 that controls these components.
More Like This:
Inventors:
Takashi Fukuzawa
Kawaguchi
Takeuchi Hidemitsu
Kawaguchi
Takeuchi Hidemitsu
Application Number:
JP2019564763A
Publication Date:
May 13, 2020
Filing Date:
January 11, 2019
Export Citation:
Assignee:
NIPPON SHEET GLASS COMPANY,LIMITED
International Classes:
C12M1/00; G01N35/08; G01N37/00
Domestic Patent References:
| JP2014163713A |
Foreign References:
| WO2017119382A1 | ||||
| WO2017094674A1 | ||||
| WO2018084017A1 | ||||
| WO2018235766A1 |
Attorney, Agent or Firm:
Sakaki Morishita