Title:
露光システム、露光装置及び露光方法
Document Type and Number:
Japanese Patent JP6704462
Kind Code:
B2
Abstract:
An exposure system (10), an exposure apparatus and an exposure method are disclosed. The exposure system (10) includes: a laser unit (11), a light spot switching unit (12) and a lens unit (13); the laser unit (11) is configured for producing a laser beam; the light spot switching unit (12) is configured to direct the laser beam to travel along one of different optical paths based on a desired size of a light spot for a workpiece to be exposed so that a laser beam in correspondence with the desired size of the light spot is obtained; and the lens unit (13) is configured for altering a direction in which the laser beam is incident on the workpiece. The light spot switching unit (12) enables the laser beam to be switched between the different optical paths so as to form light spots sized in different ranges, which can satisfy different needs of workpieces with various critical dimensions. As a result, an improvement in processing adaptability to different workpieces and a significant reduction in cost can be achieved.
Inventors:
Ranker
Giraffe pin
Chen Young Hui
Giraffe pin
Chen Young Hui
Application Number:
JP2018543394A
Publication Date:
June 03, 2020
Filing Date:
February 17, 2017
Export Citation:
Assignee:
Shanghai Micro Electronics Equipment (Group) Company Limited
International Classes:
G03F7/20
Domestic Patent References:
| JP2004066327A | ||||
| JP2001203141A | ||||
| JP2006098726A | ||||
| JP2013154378A | ||||
| JP2001269793A | ||||
| JP2011169924A | ||||
| JP2009106981A | ||||
| JP2003500220A |
Foreign References:
| KR1020120129759A | ||||
| CN101487978A |
Attorney, Agent or Firm:
Kazuko Fujita