Title:
焦点感応オーバーレイターゲットを使用する焦点決定のためのシステムおよび方法
Document Type and Number:
Japanese Patent JP6723269
Kind Code:
B2
Abstract:
A lithography mask is disclosed. The lithography mask includes at least one asymmetric segmented pattern element. A particular asymmetric segmented pattern element includes at least two segments with a separation distance between consecutive segments smaller than a resolution of a set of projection optics for generating an image of the particular asymmetric segmented pattern element on a sample such that the image of the particular asymmetric segmented pattern element is an unsegmented pattern image. A position of the unsegmented pattern image on the sample is indicative of a location of the sample along an optical axis of the set of projection optics.
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Inventors:
Meeher Walter
Application Number:
JP2017559548A
Publication Date:
July 15, 2020
Filing Date:
May 13, 2016
Export Citation:
Assignee:
KLA Corporation
International Classes:
G03F1/70; G03F7/20; G03F7/207
Domestic Patent References:
| JP2004172600A | ||||
| JP2008028389A |
Foreign References:
| US20130336572 | ||||
| US7566517 | ||||
| CN102540737A |
Attorney, Agent or Firm:
Patent Corporation yki International Patent Office