Title:
基板処理装置、及びデバイス製造方法
Document Type and Number:
Japanese Patent JP6733778
Kind Code:
B2
Abstract:
An exposure apparatus EX that conveys a long substrate P lengthwise, that forms a prescribed pattern upon the substrate P, and that comprises: a rotating drum DR that supports the substrate P; a main body frame 21 and a first optical surface plate 23 that act as a first support member that pivotally supports the rotating drum DR; a drawing apparatus 11 that is arranged so as to face the rotating drum DR with the substrate P therebetween and that forms a pattern upon the substrate P; a second optical surface plate 25 that acts as a second support member that holds the drawing apparatus 11; a rotation mechanism 24 that rotatably connects the first optical surface plate 23 and the second optical surface plate 25; scale parts GPa, GPb that are for measuring the displacement of the rotating drum DR; and encoder heads EN1, EN2 that are provided on a second-optical-surface-plate 25 side and that detect the graduations of the scale parts GPa, GPb.
Inventors:
Hiroki Komiyama
Masaki Kato
Tomoya Suzuki
Kei Nara
Masaki Kato
Tomoya Suzuki
Kei Nara
Application Number:
JP2019091674A
Publication Date:
August 05, 2020
Filing Date:
May 14, 2019
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
G03F7/20; H01L21/68
Domestic Patent References:
| JP8316135A | ||||
| JP9260250A | ||||
| JP2001215718A | ||||
| JP2005026528A | ||||
| JP2007264022A |
Foreign References:
| WO2015152217A1 | ||||
| WO2015152218A1 | ||||
| US20040130613 | ||||
| US20100188646 | ||||
| US20110080570 |
Attorney, Agent or Firm:
Sakai International Patent Office