Title:
元素分布測定方法及び元素分布測定装置
Document Type and Number:
Japanese Patent JP6740736
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method for measuring an element distribution with SIMS, in which a plurality of element distributions can be measured in the same region.SOLUTION: By applying a scanning voltage to a deflection plate 150, a primary ion is scanned and entered to a sample 110 in which an optimal bias voltage is applied to an element as a measurement target. A secondary ion discharged from the sample is detected by a mass spectrograph 190. In an element distribution for measuring distribution of a plurality of elements included in a predetermined region of the sample, the scanning voltage added a correction corresponded to a difference of the optimal bias voltage to each of the elements is applied so that a first element and a second element are measured in the predetermined region, and the distribution of the first and second element is measured.SELECTED DRAWING: Figure 7
Inventors:
Mayumi Shino
Yuji Kataoka
Yuji Kataoka
Application Number:
JP2016117947A
Publication Date:
August 19, 2020
Filing Date:
June 14, 2016
Export Citation:
Assignee:
富士通株式会社
International Classes:
H01J37/252; G01N27/62; H01J37/256; H01J49/00; H01J49/14; H01J49/22; H01J49/26
Domestic Patent References:
| JP61097557A |
Foreign References:
| US5034605 |
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Takao Kato
Tadahiko Ito
Takao Kato