Title:
ガラス基板の製造方法、及び、ガラス基板の製造装置
Document Type and Number:
Japanese Patent JP6749123
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a manufacturing method for a glass substrate that can suppress melting unevenness of a glass raw material.SOLUTION: A melting tank has: a feed opening for feeding a glass raw material substantially over the entire surface of liquid level of molten glass reserved in the melting tank; a plurality of heating devices for heating and melting the glass raw material fed from the feed opening; a plurality of pairs of electrodes for supplying the molten glass reserved in the melting tank for electric heating; and an outflow opening for letting the molten glass flow toward a molding device at a side wall position of the melting tank opposed to the feed opening. The heating devices are provided at positions above the liquid level of the molten glass at the position where the pairs of electrodes are provided, and have, from the feed opening to the outflow opening, at least a first region, a second region, and a third region, which are so set that heating quantity of first region>heating quantity of second region so as to allow the molten glass to flow from the first region to the second region, heating quantity of third region>heating quantity of second region so as to allow the molten glass to flow from the third region to the second region, and heating quantity of third region>heating quantity of first region so as to allow the molten glass to flow from the third region to the first region.SELECTED DRAWING: Figure 6
Inventors:
Shingo Fujimoto
Mizuno Makoto
Mizuno Makoto
Application Number:
JP2016070194A
Publication Date:
September 02, 2020
Filing Date:
March 31, 2016
Export Citation:
Assignee:
avanstrate corporation
Avan Straight Korea Inc.
Avan Straight Korea Inc.
International Classes:
C03B5/183; C03B5/027
Domestic Patent References:
| JP2013216532A | ||||
| JP2003095662A | ||||
| JP2002060226A | ||||
| JP3103328A |
Foreign References:
| WO2012132474A1 | ||||
| WO2014157349A1 | ||||
| US20120180531 | ||||
| WO2011136086A1 |
Attorney, Agent or Firm:
Global IP Tokyo Patent Business Corporation