Title:
二次電子生成組成物
Document Type and Number:
Japanese Patent JP6756621
Kind Code:
B2
Abstract:
The present invention relates to a resist composition, especially for use in the production of electronic components via electron beam lithography. In addition to the usual base polymeric component (resist polymer), a secondary electron generator is included in resist compositions of the invention in order to promote secondary electron generation. This unique combination of components increases the exposure sensitivity of resists in a controlled fashion which facilitates the effective production of high-resolution patterned substrates (and consequential electronic components), but at much higher write speeds.
Inventors:
Lewis, Scott
Stephen Yates
Richard Winpennie
Stephen Yates
Richard Winpennie
Application Number:
JP2016558672A
Publication Date:
September 16, 2020
Filing Date:
March 24, 2015
Export Citation:
Assignee:
THE UNIVERSITY OF MANCHESTER
International Classes:
G03F7/004; G03F1/20; G03F7/027; G03F7/039; G03F7/20; H01L21/027
Domestic Patent References:
| JP2011253185A | ||||
| JP2010152136A | ||||
| JP2012185484A |
Foreign References:
| US4414313 |
Attorney, Agent or Firm:
Shoichi Okuyama
Arihara Koichi
Matsushima Tetsuo
Hidefumi Kawamura
Ayako Nakamura
Satoshi Morimoto
Yu Tanaka
Tokumoto Koichi
Akiko Mizushima
Arihara Koichi
Matsushima Tetsuo
Hidefumi Kawamura
Ayako Nakamura
Satoshi Morimoto
Yu Tanaka
Tokumoto Koichi
Akiko Mizushima