Title:
化学増幅レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP6773006
Kind Code:
B2
Abstract:
A chemically amplified resist composition comprising a quencher containing an iodonium iodide and an acid generator exhibits a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having improved resolution, LWR and CDU.
Inventors:
Jun Hatakeyama
Application Number:
JP2017217123A
Publication Date:
October 21, 2020
Filing Date:
November 10, 2017
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2013092590A | ||||
| JP2011033772A | ||||
| JP2007272072A | ||||
| JP2016117878A | ||||
| JP7179511A | ||||
| JP5257279A | ||||
| JP2002131897A |
Foreign References:
| US20130101936 |
Attorney, Agent or Firm:
Hideaki International Patent Office