Title:
回折素子の設計方法
Document Type and Number:
Japanese Patent JP6784710
Kind Code:
B2
Abstract:
To provide a diffraction element capable of achieving high power conversion efficiency.SOLUTION: The method for designing a diffraction element comprises the steps of: determining electromagnetic field intensity distribution on an image formation surface from desired light intensity distribution on the image formation surface; determining electromagnetic field intensity distribution on a diffraction element surface on the basis of the electromagnetic field intensity distribution; determining the amount of phase modulation in the diffraction element from a phase after phase conversion on the diffraction element surface determined therefrom and the phase of incident light determined from the electromagnetic field intensity distribution of the incident light; converting the amount of phase modulation; approximating the converted amount of phase modulation to any of the amount of phase modulation having 8 grayscale or more between 0 or more and less than 2π; and determining the thickness of the diffraction element on the basis of the amount of phase modulation approximated to 8 gradations or more and the wavelength of the incident light.SELECTED DRAWING: Figure 5
More Like This:
JP6382482 | Diffraction grating recording medium |
JPH07130022 | OPTICAL HEAD DEVICE AND OPTICAL ELEMENT |
JP2006308611 | LENS SYSTEM AND CAMERA MODULE EQUIPPED THEREWITH |
Inventors:
Kinyuki Imai
Kawamura Munenori
Tadashi Sakamoto
Kawamura Munenori
Tadashi Sakamoto
Application Number:
JP2018014947A
Publication Date:
November 11, 2020
Filing Date:
January 31, 2018
Export Citation:
Assignee:
Nippon Telegraph and Telephone Corporation
International Classes:
G02B5/18
Domestic Patent References:
JP2002048914A | ||||
JP2004184609A |
Attorney, Agent or Firm:
Patent Business Corporation Tani/Abe Patent Office