Title:
被膜形成方法
Document Type and Number:
Japanese Patent JP6788422
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a film formation method capable of obtaining simply a casual uneven pattern.SOLUTION: In a film formation method, after applying an aqueous covering material having a viscosity of 1pa-s or higher and 30pa-s or lower, a pattern roller having, on a roller surface, a plurality of recesses and protrusions in which a surface area per protrusion is 0.5 mmor more and 20 mmor less is rolled, to thereby obtain an uneven pattern.SELECTED DRAWING: Figure 1
Inventors:
Kazutomo Kitawaki
Application Number:
JP2016157119A
Publication Date:
November 25, 2020
Filing Date:
August 10, 2016
Export Citation:
Assignee:
SK KAKEN CO.,LTD.
International Classes:
B05D5/06; B05D3/12; E04F13/02
Domestic Patent References:
| JP49115130A | ||||
| JP321671A | ||||
| JP2002263565A | ||||
| JP11123362A |