Title:
スパッタリングターゲット、光学機能膜、及び、積層配線膜
Document Type and Number:
Japanese Patent JP6801168
Kind Code:
B2
Abstract:
This sputtering target: includes the metallic elements Mo and/or In and Cu and/or Fe as main components; contains 5-80at% of Mo and/or In and 20-95at% of Cu and/or Fe, and comprises some or all of the metal elements in the form of oxides.
Inventors:
Atsushi Saito
Zhang Mamoru
Ichiro Shiono
Zhang Mamoru
Ichiro Shiono
Application Number:
JP2015116826A
Publication Date:
December 16, 2020
Filing Date:
June 09, 2015
Export Citation:
Assignee:
Mitsubishi Materials Corporation
International Classes:
C23C14/34; B32B9/00; C23C14/08; G06F3/041; H01L21/28; H01L21/285
Domestic Patent References:
| JP2002206166A | ||||
| JP10301499A |
Foreign References:
| WO2012029454A1 | ||||
| CN103114264A | ||||
| WO2014027636A1 |
Other References:
ACS Combinatorial Science,2013年,Vol. 15,pp. 580-584
Attorney, Agent or Firm:
Yasushi Matsunuma
Mitsuo Teramoto
Fumihiro Hosokawa
Kazunori Onami
Masatake Shiga
Mitsuo Teramoto
Fumihiro Hosokawa
Kazunori Onami
Masatake Shiga