Title:
メトロロジツール及びメトロロジツールを使用する方法
Document Type and Number:
Japanese Patent JP6808041
Kind Code:
B2
Abstract:
A method including: subsequent to a first device lithographic step of a device patterning process, measuring a degraded metrology mark on an object and/or a device pattern feature associated with the degraded metrology mark, the degraded metrology mark arising at least in part from the first device lithographic step on the object; and prior to a second device lithographic step of the device patterning process on the object, creating a replacement metrology mark, for use in the patterning process in place of the degraded metrology mark, on the object.
Inventors:
Kreuzer, Justin, Lloyd
Application Number:
JP2019529885A
Publication Date:
January 06, 2021
Filing Date:
December 13, 2017
Export Citation:
Assignee:
AS ML Holding N.V.
International Classes:
G03F9/00; G01B11/00
Domestic Patent References:
| JP1184824A | ||||
| JP5047649A | ||||
| JP2007049074A | ||||
| JP2004165666A |
Foreign References:
| US20050185183 | ||||
| US6383888 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito
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