Title:
検査システムにおける合焦のための方法及びデバイス
Document Type and Number:
Japanese Patent JP6812536
Kind Code:
B2
Abstract:
An inspection apparatus includes an inspection optical system configured to a direct an inspection beam onto a surface of a substrate, the inspection optical system having an objective, a focus measurement optical system configured to receive a focus measurement beam, redirected by the substrate, from the objective, the focus measurement optical system having a movable reflective element configured to receive the focus measurement beam, and a control system configured to cause movement of the reflective element with a direction component along a beam path of the focus measurement beam and configured to determine whether the substrate surface is in the focus of the objective based on the focus measurement beam.
Inventors:
Shamaleff, Jevgeny, Constantinovic
Smirnov, Stanislav
Smirnov, Stanislav
Application Number:
JP2019508176A
Publication Date:
January 13, 2021
Filing Date:
August 18, 2017
Export Citation:
Assignee:
AS ML Holding N.V.
International Classes:
G01B11/00; G03F7/20
Domestic Patent References:
| JP7294225A | ||||
| JP2001280910A | ||||
| JP2003240509A | ||||
| JP2015114109A | ||||
| JP2006023221A |
Foreign References:
| US5043589 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito