Title:
金属薄膜基材の製造方法
Document Type and Number:
Japanese Patent JP6821422
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a manufacturing method of a metallic thin film substrate including a metallic thin film having higher purity on a substrate.SOLUTION: Manufacture of a metallic thin film substrate 1 including a substrate 11, and a metallic thin film 12 formed on the substrate 11 requires execution of steps of: condensing steam on the surface of a dry thin film formed on the substrate 11, by using a metal ink composition for forming the metallic thin film 12; and forming the metallic thin film 12 by heating and evaporating water generated by condensation of steam on the surface of the dry thin film.SELECTED DRAWING: Figure 1
Inventors:
Takanari Sakai
Naoki Iguchi
Naoki Iguchi
Application Number:
JP2016248160A
Publication Date:
January 27, 2021
Filing Date:
December 21, 2016
Export Citation:
Assignee:
Toppan Forms Co., Ltd.
International Classes:
B05D3/04; B05D7/24; C09D11/00
Domestic Patent References:
| JP2015508434A | ||||
| JP2016206176A |
Foreign References:
| WO2016052292A1 |
Attorney, Agent or Firm:
Shu Oikawa
Kazunori Onami
Hagiwara Ayatsu
Masatake Shiga
Ryuichiro Mori
Masato Iida
Kazunori Onami
Hagiwara Ayatsu
Masatake Shiga
Ryuichiro Mori
Masato Iida