Title:
光学素子の製造方法
Document Type and Number:
Japanese Patent JP6831541
Kind Code:
B2
Abstract:
To provide a method for manufacturing a high quality optical element, capable of processing the surface of the optical element material used for an optical system having a wavelength band from a vacuum ultraviolet region to a hard X-ray region with high accuracy by an excellent and actual EEM process and substantially reducing fine particles stuck to a surface, especially a reflective surface to reduce the optical influence of the stuck fine particles.SOLUTION: A method for manufacturing an optical element comprises: an EEM processing step of creating an optical element material surface 2 having desired accuracy; and a surface treatment step of interacting a treatment solution including water with a catalytic metal surface to promote the direct hydrolysis or oxidation of an optical element material 1 and the hydrolysis of the oxide film by catalytic function and removing stuck fine particles 3 including processed fine particles stuck to a surface served as at least a reflective surface in the optical element material surfaces using a catalyst assist etching process for removing a decomposition product caused by hydrolysis from the optical element material.SELECTED DRAWING: Figure 1
Inventors:
Kazuto Yamauchi
Ai Ichii
Hiromi Okada
Naofumi Tsumura
Ai Ichii
Hiromi Okada
Naofumi Tsumura
Application Number:
JP2018039728A
Publication Date:
February 17, 2021
Filing Date:
March 06, 2018
Export Citation:
Assignee:
J-Tech Corporation Co., Ltd.
National University Corporation Osaka University
National University Corporation Osaka University
International Classes:
G02B5/26; B24B1/00; B24B37/00; B24C3/32; B24C11/00; G02B5/08
Domestic Patent References:
| JP2010188487A | ||||
| JP2016132083A | ||||
| JP2008121099A | ||||
| JP2014038981A |