Title:
マスクパターン、マスク、およびマスクの製造方法
Document Type and Number:
Japanese Patent JP6869253
Kind Code:
B2
Abstract:
Methods and apparatus (400) for a shadow mask are provided. A mask pattern (302) includes a mandrel (305) comprising a material having a coefficient of thermal expansion less than or equal to about 7 microns/meter/degrees Celsius with a conductive material formed thereon, and a dielectric material (310) having a plurality of openings (318) formed therein exposing at least portion of the conductive material. The dielectric material (310) comprises a pattern of volumes, each of the volumes has a major dimension of about 5 microns to about 20 microns.
Inventors:
Huangshi
La Sita Bryan Yi
Hearth Dieter
Honda Ryogo
Takashi Nakajima
La Sita Bryan Yi
Hearth Dieter
Honda Ryogo
Takashi Nakajima
Application Number:
JP2018539987A
Publication Date:
May 12, 2021
Filing Date:
February 03, 2016
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
C23C14/04; H01L51/50; H05B33/10
Domestic Patent References:
| JP2014077155A | ||||
| JP2014218747A | ||||
| JP200345657A | ||||
| JP2016125097A | ||||
| JP2003107723A |
Attorney, Agent or Firm:
Satoshi Morimoto