Title:
レジスト組成物及びレジストパターン形成方法
Document Type and Number:
Japanese Patent JP6872530
Kind Code:
B2
Abstract:
This resist composition contains: a base material component (A) of which the resolvability with respect to a photographic developer changes by the action of an acid; and an acid generator component (B) which generates an acid upon exposure to light, wherein the base material component (A) contains a polymer having a structural unit represented by formula (1), and the acid generator component (B) has an anion represented by formula (2) [In formula (1): Rx represents a hydrogen atom, an alkyl group having 1-5 carbon atoms or a halogenated alkyl group having 1-5 carbon atoms; Z represents a single bond or an alkyl group having 1-5 carbon atoms; and Cp represents a group represented by formula (Cp-1). In formula (Cp-1), R2 represents a tertiary alkyl group. In formula (2): Ry represents a cyclic hydrocarbon group having 3-20 carbon atoms and optionally having a hetero atom; A represents ―O(C=O)― or ―(C=O)O―; L represents a single bond or a divalent hydrocarbon group having a hetero atom; each X represents H or F; and n represents an integer of 0-10].
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Inventors:
Takeshi Nakamura
Isano Tanno
Lee Jun Yeop
Isano Tanno
Lee Jun Yeop
Application Number:
JP2018509183A
Publication Date:
May 19, 2021
Filing Date:
March 23, 2017
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/004; C08F20/18; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2015169674A | ||||
| JP2015141353A | ||||
| JP2016006493A | ||||
| JP2014178671A | ||||
| JP201237864A |
Foreign References:
| WO2011122336A1 | ||||
| WO2017065207A1 |
Attorney, Agent or Firm:
Sumio Tanai
Matsumoto
Ryu Miyamoto
Masato Iida
Matsumoto
Ryu Miyamoto
Masato Iida