Title:
マイクロ波プラズマ処理装置およびマイクロ波プラズマ処理方法
Document Type and Number:
Japanese Patent JP6883953
Kind Code:
B2
Abstract:
Disclosed is a microwave plasma processing apparatus including: a chamber that accommodates a workpiece; a microwave generating source that generates microwaves; a waveguide unit that guides the microwaves toward the chamber; a planar antenna made of a conductor having a plurality of slots that radiate the microwaves toward the chamber; a microwave-transmitting plate made of a dielectric material that constitutes a top wall of the chamber and transmits the microwaves radiated from the plurality of slots; a gas supply mechanism that supplies a gas into the chamber; and an exhaust mechanism that exhausts an atmosphere in the chamber. The planar antenna includes a plurality of slot groups each forming one unit including one or more of the slots, and the slots are formed so as to form an odd number of the slot groups equal to or more than three in a circumferential direction.
Inventors:
Toshio Nakanishi
Koji Tanaka
Aida Rintaka
Takafumi Nogami
Koji Tanaka
Aida Rintaka
Takafumi Nogami
Application Number:
JP2016115931A
Publication Date:
June 09, 2021
Filing Date:
June 10, 2016
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H05H1/46; C23C16/511; H01L21/31; H01L21/318
Domestic Patent References:
| JP2015130325A | ||||
| JP2014075234A | ||||
| JP2013016443A | ||||
| JP2013020973A |
Foreign References:
| WO2011125524A1 | ||||
| US7305935 |
Attorney, Agent or Firm:
Hiroshi Takayama