Title:
インプリント装置、および物品製造方法
Document Type and Number:
Japanese Patent JP6884048
Kind Code:
B2
Abstract:
To provide an imprinting apparatus which is advantageous in terms of removing a foreign matter.SOLUTION: An imprinting apparatus for forming a pattern on an imprint material on a substrate by using a mold includes an ion supply unit that supplies ions to a space between the mold and the substrate, a capturing unit that is provided in the space and captures a foreign matter by being charged, and a control unit that controls a voltage to be applied to the capturing unit such that the charge accumulated in the capturing unit by the ions from the ion supply unit decreases during the exchange of the substrate or the mold.SELECTED DRAWING: Figure 1
Inventors:
Kazuki Nakagawa
Masami Yonekawa
Masami Yonekawa
Application Number:
JP2017119888A
Publication Date:
June 09, 2021
Filing Date:
June 19, 2017
Export Citation:
Assignee:
Canon Inc
International Classes:
H01L21/027; B29C59/02; H01L21/683; H05F3/06
Domestic Patent References:
| JP2016208006A | ||||
| JP2016076695A | ||||
| JP7161598A | ||||
| JP59117470U | ||||
| JP2013197465A | ||||
| JP2014225582A | ||||
| JP2015149390A |
Foreign References:
| US20090295006 |
Attorney, Agent or Firm:
Patent Business Corporation Otsuka International Patent Office