Title:
プラズマ処理装置およびプラズマ処理品の製造方法
Document Type and Number:
Japanese Patent JP6886347
Kind Code:
B2
Abstract:
To suppress variations in surface treatment quality by suppressing a temperature distribution differences in a temperature chamber in plasma treatment.SOLUTION: A plasma treatment device 1 turns treatment gas fed into a treatment chamber 2 that stores a treatment object P, into plasma, and performs surface treatment of the treatment object P. The device has a support member 3 that supports the treatment object P, a power supply 4 that is electrically connected so that a treatment chamber body 2a is an anode and the support member 3 is a cathode, and a cooling device 10 that cools the central part of a plasma treatment region, which is a region in which the plasma treatment of the treatment object P is performed in the treatment chamber 2.SELECTED DRAWING: Figure 1
Inventors:
Tsunetaka Yamada
Application Number:
JP2017103303A
Publication Date:
June 16, 2021
Filing Date:
May 25, 2017
Export Citation:
Assignee:
DOWA Thermotech Co., Ltd.
International Classes:
C23C16/44; B01J19/08
Domestic Patent References:
| JP3087372A | ||||
| JP2002220672A | ||||
| JP2012224925A | ||||
| JP2011252179A |
Attorney, Agent or Firm:
Koji Hagiwara
Tetsuo Kanamoto
Takashi Saito
Tetsuo Kanamoto
Takashi Saito