Title:
チャンバ内部の流れを拡散させることによる低い粒子数及びより良好なウエハ品質のための効果的で新しい設計
Document Type and Number:
Japanese Patent JP6888159
Kind Code:
B2
Abstract:
Embodiments described herein generally relate to a processing chamber having one or more gas inlet ports located at a bottom of the processing chamber. Gas flowing into the processing chamber via the one or more gas inlet ports is directed along a lower side wall of the processing chamber by a plate located over each of the one or more gas inlet ports or by an angled opening of each of the one or more gas inlet ports. The one or more gas inlet ports and the plates may be located at one end of the processing chamber, and the gas flow is directed towards an exhaust port located at the opposite end of the processing chamber by the plates or the angled openings. Thus, more gas can be flowed into the processing chamber without dislodging particles from a lid of the processing chamber.
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Inventors:
Sunday, Biswas Kumar
Shah, Cartique
Ton, Edrick
Vasdeva, Prashant
Shah, Cartique
Ton, Edrick
Vasdeva, Prashant
Application Number:
JP2020143254A
Publication Date:
June 16, 2021
Filing Date:
August 27, 2020
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
H01L21/205; C23C16/44; H01L21/3065
Domestic Patent References:
| JP6756853B2 | ||||
| JP2011054968A | ||||
| JP2001035797A | ||||
| JP2002299248A | ||||
| JP2014152833A | ||||
| JP2010225718A | ||||
| JP2015161030A | ||||
| JP2001077092A | ||||
| JP2012069904A |
Foreign References:
| KR1020130007149A | ||||
| WO2015151147A1 | ||||
| US20120269968 |
Attorney, Agent or Firm:
Sonoda/Kobayashi Patent Business Corporation