Title:
基板処理装置、基板処理方法及び記憶媒体
Document Type and Number:
Japanese Patent JP6917147
Kind Code:
B2
Abstract:
Disclosed is a substrate processing apparatus including: a processing chamber that accommodates a substrate; a light source that radiates energy rays for a processing to the substrate in the processing chamber; a rotation driving unit that rotates at least one of the substrate and the light source around an axis intersecting with the substrate in the processing chamber; an opening/closing mechanism that switches between an open state and a closed state; and a controller configured to control the opening/closing mechanism to switch between the open state and the closed state, to increase a light emission amount of the light source in synchronization with the switch of the open state to the closed state by the opening/closing mechanism, and to decrease the light emission amount of the light source in synchronization with the switch of the closed state to the open state by the opening/closing mechanism.
Inventors:
Takaya Oniumi
Yuichi Yoshida
Yuzo Oishi
Yuichi Yoshida
Yuzo Oishi
Application Number:
JP2017013013A
Publication Date:
August 11, 2021
Filing Date:
January 27, 2017
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/027; H01L21/304
Domestic Patent References:
| JP2016027617A | ||||
| JP10512100A | ||||
| JP2000315A | ||||
| JP63079323A | ||||
| JP2005228790A | ||||
| JP2010186815A | ||||
| JP2007157828A |
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshiki Kuroki
Junji Kashiwaoka
Shigeki Matsuo
Yoshiki Kuroki
Junji Kashiwaoka
Shigeki Matsuo