Title:
金属酸化物薄膜形成装置及び金属酸化物薄膜形成方法
Document Type and Number:
Japanese Patent JP6924515
Kind Code:
B2
Abstract:
A disclosed metal oxide thin film formation apparatus is equipped with: a vacuum vessel; a treatment vessel which is disposed inside the vacuum vessel, is capable of horizontally rotating about a central axis inclined from the horizontal direction, and has an opening on one end face thereof; an oxidizing gas supply device which supplies an oxidizing gas into the vacuum vessel; an organic metal gas supply device which is inserted inward from the opening and supplies an organic metal gas; and a control unit for executing a series of steps, namely, an organic metal gas supply step, a first gas discharge step, an oxidizing gas supply step, and a second gas discharge step, and repeating the series of steps through for a predetermined number of times in accordance with the film thickness of the metal oxide thin film to be formed on the surfaces of microparticles.
Inventors:
Fumihiko Hirose
Makoto Ishikawa
Masanori Miura
Makoto Ishikawa
Masanori Miura
Application Number:
JP2019554285A
Publication Date:
August 25, 2021
Filing Date:
November 15, 2018
Export Citation:
Assignee:
Yamagata University
International Classes:
C23C16/40; B22F1/16; C23C16/44; C23C16/455; B22F1/145
Domestic Patent References:
| JP2017137550A | ||||
| JP2016131222A |
Foreign References:
| WO2009064592A1 |
Attorney, Agent or Firm:
Hiroyuki Kurihara
Mountain Saki Yuichiro
Mountain Saki Yuichiro