Title:
水素バリア剤、水素バリア膜形成用組成物、水素バリア膜、水素バリア膜の製造方法、及び電子素子
Document Type and Number:
Japanese Patent JP6935287
Kind Code:
B2
Abstract:
To provide a hydrogen barrier agent capable of imparting hydrogen barrier performance to various materials; a hydrogen barrier film forming composition including the hydrogen barrier agent; a hydrogen barrier film including the hydrogen barrier agent; a method for producing a hydrogen barrier film, which uses the hydrogen barrier film forming composition; and an electronic element provided with the hydrogen barrier film. A compound having a specific structure including an imidazolyl group is used as the hydrogen barrier agent. Furthermore, the hydrogen barrier film forming composition is prepared by blending the above-mentioned hydrogen barrier agent into the base material component. In addition, the hydrogen barrier film is formed using the hydrogen barrier film forming composition.
Inventors:
Jiro Hikida
Someya Kazuya
Koichi Misumi
Shioda Dai
Someya Kazuya
Koichi Misumi
Shioda Dai
Application Number:
JP2017189228A
Publication Date:
September 15, 2021
Filing Date:
September 28, 2017
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
H01L21/312; C08F2/44; C08F2/50; C08F220/10; C08F265/00; G03F7/004; G03F7/027; H01L21/336; H01L29/786; H01L51/50; H05B33/04; H05B33/22
Domestic Patent References:
| JP2009215368A | ||||
| JP2010507900A | ||||
| JP59017266A |
Foreign References:
| WO2016031928A1 | ||||
| WO2014083845A1 | ||||
| WO2015129670A1 |
Attorney, Agent or Firm:
Masayuki Masabayashi