Title:
モノメチルヒドラジンガスの精製方法
Document Type and Number:
Japanese Patent JP6941424
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a manufacturing method of monomethylhydrazine gas capable of removing moisture contained in marketed monomethylhydrazine with purity of 98 wt.% or more, suppressing generation of ammonia and the like by self-decomposition and providing monomethylhydrazine gas containing almost no impurity.SOLUTION: By conducting a purification treatment for contacting monomethylhydrazine gas with an absorbent mainly containing alumina and containing no synthetic zeolite, moisture or impurities such as monomethyl amine contained in the monomethylhydrazine gas is removed.SELECTED DRAWING: Figure 1
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Inventors:
Masaya Yamawaki
Itsuto Murata
Itsuto Murata
Application Number:
JP2016201119A
Publication Date:
September 29, 2021
Filing Date:
October 12, 2016
Export Citation:
Assignee:
Taiyo Nippon Sanso Co., Ltd.
International Classes:
C07C241/02; C07C243/14
Domestic Patent References:
| JP8245207A |
Foreign References:
| US3598546 |
Attorney, Agent or Firm:
Yoshihiko Kido