Title:
均一及び不均一触媒配合物を用いてエチレンインターポリマーの分子量を増加させ、密度を減少させるための手段
Document Type and Number:
Japanese Patent JP6944539
Kind Code:
B2
Abstract:
A continuous solution polymerization process is disclosed wherein at least two catalyst formulations are employed. A first homogeneous catalyst formulation is employed in a first reactor to produce a first ethylene interpolymer and a first heterogeneous catalyst formulation is employed in a second reactor to produce a second ethylene interpolymer. Optionally a third ethylene interpolymer is formed in a third reactor. The resulting ethylene interpolymer products possess desirable properties in a variety of end use applications, for example in film applications. A means for increasing the molecular weight of the first ethylene interpolymer is disclosed and/or a means for increasing the temperature of the first reactor, relative to a third homogeneous catalyst formulation. A means for reducing the (α-olefin/ethylene) weight ratio in the first reactor is disclosed and/or reducing the density of the first ethylene interpolymer, relative to a third homogeneous catalyst formulation.
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Inventors:
Chan, Zhong Long
Kazumi, Niousha
Solomons, Stephen
Clechek, Monica
Kesztkar, Maid
Molloy, Brian
WANG Qingyang
Zorikak, Peter
Carter, charles
Wang, Xiao Chuan
Dovin, Christopher
Shibutan, Fuzzle
Taylor, Kenneth
Van Asseldonk, Lawrence
Kirk Daman, Hamido Reza
Kazumi, Niousha
Solomons, Stephen
Clechek, Monica
Kesztkar, Maid
Molloy, Brian
WANG Qingyang
Zorikak, Peter
Carter, charles
Wang, Xiao Chuan
Dovin, Christopher
Shibutan, Fuzzle
Taylor, Kenneth
Van Asseldonk, Lawrence
Kirk Daman, Hamido Reza
Application Number:
JP2019556959A
Publication Date:
October 06, 2021
Filing Date:
April 17, 2018
Export Citation:
Assignee:
Nova Chemicals (International) Society Anonym
International Classes:
C08F210/16; C08F4/654; C08F4/655; C08F4/6592; C08L23/08
Domestic Patent References:
| JP2006124567A | ||||
| JP2015033441A | ||||
| JP8509767A | ||||
| JP2017531725A | ||||
| JP2011052141A |
Attorney, Agent or Firm:
Asamura patent office