Title:
高分子フィルム積層基板およびフレキシブル電子デバイスの製造方法
Document Type and Number:
Japanese Patent JP6950713
Kind Code:
B2
Abstract:
[Problem] To provide a polyimide film laminated substrate in which stable peeling with a constant low force from an inorganic substrate is enabled when a polyimide film is to be peeled from an inorganic substrate even after heat treatment at a temperature exceeding 500° C. is performed.[Solution] Silane coupling agent treatment is performed on an inorganic substrate on which a thin film of an aluminum oxide, a thin film of a composite oxide of aluminum and silicon, a thin film of molybdenum or tungsten, or an alloy thin film of molybdenum and tungsten is formed continuously or discontinuously on a part of at least one surface thereof, and a polyimide film layer is further laminated on the silane coupling agent layer. In the obtained laminate, the part where the aluminum oxide thin film layer is present functions as an easily-peelable layer, the part where no aluminum oxide thin film layer functions as an easily-bondable part. The bonding strength of the easily-peelable part does not change even after heat treatment at 500° C. or more, and the low value is stably maintained.
Inventors:
Tetsuo Okuyama
Naoki Watanabe
Toshiyuki Tsuchiya
Masahiro Yamashita
Toku Keiya Ta
Naoki Watanabe
Toshiyuki Tsuchiya
Masahiro Yamashita
Toku Keiya Ta
Application Number:
JP2018564570A
Publication Date:
October 13, 2021
Filing Date:
January 23, 2018
Export Citation:
Assignee:
Toyobo Co., Ltd.
International Classes:
B32B9/00; B32B3/22; B32B7/06; B32B15/04; B32B27/00; B32B27/34; H01L21/02; H01L21/336; H01L23/15; H01L27/12; H01L29/786
Domestic Patent References:
| JP2013168445A | ||||
| JP2014237270A | ||||
| JP2013010342A | ||||
| JP2016005899A | ||||
| JP2011091082A |
Foreign References:
| WO2008146448A1 | ||||
| WO2012141248A1 |
Attorney, Agent or Firm:
Asfi International Patent Office