Title:
有機膜形成装置、および有機膜形成装置のクリーニング方法
Document Type and Number:
Japanese Patent JP7312235
Kind Code:
B2
Abstract:
To provide an organic film formation device which enables sufficient removal of foreign objects in a chamber, and to provide a cleaning method of the organic film formation device.SOLUTION: An organic film formation device according to one embodiment includes: a chamber which has an opening for carrying a workpiece into/out from the chamber and can maintain an atmosphere decompressed to a level lower than the atmospheric pressure; a door which may open or close the opening of the chamber; an exhaust part which may exhaust the interior of the chamber; a support part provided within the chamber and may support the workpiece; a heating part which is provided within the chamber and may heat the workpiece; and at least one nozzle which is provided within the chamber and may supply a cleaning gas to the opening of the chamber.SELECTED DRAWING: Figure 3
Inventors:
Kyouta Kuroiwa
Yosuke Mochizuki
Yuichi Imaoka
Noriaki Kobayashi
Yosuke Mochizuki
Yuichi Imaoka
Noriaki Kobayashi
Application Number:
JP2021207892A
Publication Date:
July 20, 2023
Filing Date:
December 22, 2021
Export Citation:
Assignee:
Shibaura Mechatronics Co., Ltd.
International Classes:
B05C11/10; B05C9/14; F26B3/28; F26B5/04; F26B25/00
Domestic Patent References:
| JP2012241922A | ||||
| JP2014135393A | ||||
| JP2003017384A | ||||
| JP2019205991A |
Attorney, Agent or Firm:
Masahiko Hyugaji
Junichi Kozaki
Hiroshi Ichikawa
Junichi Kozaki
Hiroshi Ichikawa
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