Title:
低酸素条件下におけるｌｏｘ遺伝子の発現量を指標とするスクリーニング方法、並びにｌｏｘ遺伝子の発現の上昇抑制剤、皮下脂肪細胞の線維化抑制剤及びたるみの改善又は予防剤
Document Type and Number:
Japanese Patent JP7328793
Kind Code:
B2
Abstract:
To provide a new technology for screening a component having an effect of improving or preventing an aging phenomenon of a skin, especially sagging.SOLUTION: A reduction effect of the expression increase of a lox gene in a cell cultivated in a hypoxia condition is used as an index.SELECTED DRAWING: Figure 4
Inventors:
Koji Mizukoshi
▲浜▼中 祥弘
Motoki Kurozumi
Mari Kuribayashi
▲浜▼中 祥弘
Motoki Kurozumi
Mari Kuribayashi
Application Number:
JP2019097359A
Publication Date:
August 17, 2023
Filing Date:
May 24, 2019
Export Citation:
Assignee:
POLA CHEMICAL INDUSTRIES, INC.
International Classes:
C12Q1/686; A61K8/9789; A61K36/36; A61P17/00; G01N33/15; G01N33/50
Domestic Patent References:
| JP2003026560A | ||||
| JP2017082014A | ||||
| JP2006316050A |
Foreign References:
| WO2017022091A1 | ||||
| WO2009125837A1 |
Other References:
生物工学,2018年,Volo.96, No.2,p.77
Attorney, Agent or Firm:
Tomoko Tsujita
Daisuke Muramatsu
Daisuke Muramatsu