Title:
電子ビームシステム及び方法
Document Type and Number:
Japanese Patent JP7329637
Kind Code:
B2
Abstract:
Performance of a multi-electron-beam system can be improved by reducing Coulomb effects in the illumination path of a multi-beam inspection system. A beam-limiting aperture with multiple holes can be positioned between an electron beam source and a multi-lens array, such as in a field-free region. The beam-limiting aperture is configured to reduce Coulomb interactions between the electron beam source and the multi-lens array. An electron beam system with the beam-limiting aperture can be used in a scanning electron microscope.
Inventors:
Brody Alan Dee
Application Number:
JP2022015515A
Publication Date:
August 18, 2023
Filing Date:
February 03, 2022
Export Citation:
Assignee:
KLA Corporation
International Classes:
H01J37/09; H01J37/21; H01J37/28
Domestic Patent References:
| JP2009545118A | ||||
| JP2010506374A | ||||
| JP2009507351A | ||||
| JP2016197503A |
Foreign References:
| US20150155134 | ||||
| US20160336142 | ||||
| US20170025241 | ||||
| KR1020120128105A | ||||
| WO2012081422A1 |
Attorney, Agent or Firm:
Patent Attorney Corporation YKI International Patent Office