Title:
化学的ガイディング構造を基板上に形成するための方法及び化学的エピタキシー方法
Document Type and Number:
Japanese Patent JP7340331
Kind Code:
B2
Abstract:
A method for forming a chemical guiding structure intended for self-assembly of a block copolymer by chemoepitaxy, where the method includes forming on a substrate a functionalisation layer made of a first polymer material having a first chemical affinity with respect to the block copolymer; forming on the substrate guiding patterns made of a second polymer material having a second chemical affinity with respect to the block copolymer, different from the first chemical affinity, and wherein the guiding to patterns have a critical dimension of less than 12.5 nm and are formed by means of a mask comprising spacers.
Inventors:
Larca Tiron
Guillaume Clabot
Amed Garbi
Laurent Pan
Xavier Chevalier
Christoph Navarro
Anne Pake
Guillaume Clabot
Amed Garbi
Laurent Pan
Xavier Chevalier
Christoph Navarro
Anne Pake
Application Number:
JP2018239148A
Publication Date:
September 07, 2023
Filing Date:
December 21, 2018
Export Citation:
Assignee:
Komisariya a Renergi Atomic E o Energy Alternate
International Classes:
H01L21/027
Domestic Patent References:
| JP2005532682A | ||||
| JP2015520510A | ||||
| JP2016526183A |
Attorney, Agent or Firm:
Kawaguchi International Patent Office