Title:
ヘリウム上の電子のためのキュービットハードウェア
Document Type and Number:
Japanese Patent JP7344489
Kind Code:
B2
Abstract:
Disclosed is a system and a method to use the system that includes a substrate to support a film of liquid helium and an electron subsystem confined by image forces in a direction perpendicular to the surface of the film, a side gate to electrostatically define a boundary of the electron subsystem, a trap gate to electrostatically define an electron trap located outside the boundary of the electron subsystem, and a load gate to selectively open and close access from the electron subsystem to the electron trap, wherein to open access to the electron trap is to apply a first load gate voltage to the load gate to allow the electrons to access the electron trap, and wherein to close access to the electron trap is to apply a second load gate voltage to the load gate to prevent the electrons from accessing the electron trap.
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Inventors:
Polanen Johannes
Beissengloff Nears
Reese David
Beissengloff Nears
Reese David
Application Number:
JP2021560588A
Publication Date:
September 14, 2023
Filing Date:
March 16, 2020
Export Citation:
Assignee:
Polanen Johannes
Beissengloff Nears
Eroque Corporation
Beissengloff Nears
Eroque Corporation
International Classes:
H10N60/10
Domestic Patent References:
| JP2016518637A | ||||
| JP2015508253A |
Foreign References:
| US20180107938 | ||||
| US20120319085 |
Attorney, Agent or Firm:
Shinichiro Tanaka
▲吉▼田 和彦
Hiroyuki Suda
Fumiaki Otsuka
Takayoshi Nishijima
Hiroshi Uesugi
Naoki Kondo
Takeo Nasu
▲吉▼田 和彦
Hiroyuki Suda
Fumiaki Otsuka
Takayoshi Nishijima
Hiroshi Uesugi
Naoki Kondo
Takeo Nasu