Title:
レジスト組成物及びレジストパターン形成方法
Document Type and Number:
Japanese Patent JP7407587
Kind Code:
B2
Abstract:
A resist composition that generates an acid upon exposure and whose solubility in a developing solution is changed by action of an acid, the resist composition containing a base material component whose solubility in a developing solution is changed by action of an acid, and a compound represented by General Formula (e1) in which Rd01 represents a monovalent organic group and Rd02 represents a single bond or a divalent linking group
Inventors:
Yasuhiro Yoshii
Yousuke Suzuki
Youichi Hori
Takahiro Kojima
Mari Murata
Yousuke Suzuki
Youichi Hori
Takahiro Kojima
Mari Murata
Application Number:
JP2019229771A
Publication Date:
January 04, 2024
Filing Date:
December 19, 2019
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| JP9006002A |
Attorney, Agent or Firm:
Sumio Tanai
Masahisa Matsumoto
Ryu Miyamoto
Masato Iida
Masahisa Matsumoto
Ryu Miyamoto
Masato Iida