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Document Type and Number:
Japanese Patent JPH0254389
Kind Code:
B2
More Like This:
JPS58160302PRODUCTION OF HIGHLY WATER-ABSORPTIVE RESIN
JP3581634A mixture consisting of a crosslinkable liquid crystal substance having a chiral phase, an LC film or an LC pigment, a method for producing an LC film or an LC pigment, and a coating material containing these.
JPS5476135ELECTRON BEAM RESIST
Inventors:
TAIMA KAZUO
Application Number:
JP18792482A
Publication Date:
November 21, 1990
Filing Date:
October 26, 1982
Export Citation:
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Assignee:
FUJIMORI KOGYO CO
International Classes:
C08F20/00; C08F20/10; C08F220/00; C08F251/00; C08F251/02; C08F255/02; C08F261/00; C08F261/04; C08F291/00; C08F291/02; C09J133/04; C09J151/00



 
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