Document Type and Number:
Japanese Patent JPH0347493
Kind Code:
B2
Abstract:
A process is described for preparing relief images, in which a light-sensitive material composed of a support and a light-sensitive layer which contains as essential constituents (a) a compound which has at least one C-O-C bond which is cleavable by acid, (b) a compound which forms a strong acid on irradiation and (c) a binder which is insoluble in water and soluble in aqueous-alkaline solutions is imagewise irradiated, warmed to an elevated temperature, cooled down and then irradiated over its entire area, whereafter those parts of the layer which have not been imagewise irradiated are then washed out by developing. The process makes it possible to prepare positive or negative copies by means of the same light-sensitive material in a simple way.
Inventors:
HANSU RUTSUKERUTO
Application Number:
JP22513482A
Publication Date:
July 19, 1991
Filing Date:
December 23, 1982
Export Citation:
Assignee:
HOECHST AG
International Classes:
G03F7/038; G03C7/00; G03C7/407; G03F7/004; G03F7/20; G03F7/26; G03F7/38; H01L21/027
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