Document Type and Number:
Japanese Patent JPH0368382
Kind Code:
B2
Abstract:
PURPOSE:To manufacture a laminate type photoconductive amorphous silicon member undergoing no deterioration even after repeated use and having superior pressure resistance, by laminatong a specified auxiliary layer, a charge implantation preventing layer and a photoconductive amorphous layer on a support. CONSTITUTION:A photoconductive member 100 is manufactured by laminating an auxiliary layer 102 made of an Si atom-base amorphous material contg. halogen atoms and <=30atomic% N atoms as constituent atoms, a charge implantation preventing layer 103 made of an Si atom-base amorphous material contg. atoms of a III group element as constituent atoms, and a photoconductive amorphous layer 104 made of an Si atom-base amorphous material contg. H atoms and/or halogen atoms as constituent atoms on a support 101 in order.
Inventors:
OGAWA KYOSUKE
SHIRAI SHIGERU
KANBE JUNICHIRO
SAITO KEISHI
OOSATO YOICHI
MISUMI TERUO
SHIRAI SHIGERU
KANBE JUNICHIRO
SAITO KEISHI
OOSATO YOICHI
MISUMI TERUO
Application Number:
JP2159782A
Publication Date:
October 28, 1991
Filing Date:
February 12, 1982
Export Citation:
Assignee:
CANON KK
International Classes:
G03G5/08; G03G5/082; H01L21/205; H01L31/0248
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