Title:
【発明の名称】薄膜状のアルファTaを形成するための方法および構造
Document Type and Number:
Japanese Patent JPH05507115
Kind Code:
A
Abstract:
The present invention relates generally to a structure and a method of making Alpha-Ta films, and more particularly, to a structure and a method of making Alpha-Ta in thin films. A seed layer of Ta reactively sputtered in a nitrogen containing environment is grown on the substrate, and using this seed layer of Ta(N) layers of Alpha-Ta are then formed.
Inventors:
Colgan, Evan, Gee.
Flyer, pieter, M.
Flyer, pieter, M.
Application Number:
JP50444591A
Publication Date:
October 14, 1993
Filing Date:
January 24, 1991
Export Citation:
Assignee:
International Business Machines Corporation
International Classes:
C23C14/14; H01L21/28; C23C14/06; H01L21/285; H01L21/768; (IPC1-7): C23C14/06
Attorney, Agent or Firm:
Kiyoshi Goda (4 outside)