Title:
【発明の名称】イオン注入のための注入量の測定及び均一性のモニタリング装置
Document Type and Number:
Japanese Patent JPH0628141
Kind Code:
B2
Abstract:
Apparatus for determining ion dose and ion dose uniformity of an ion beam scanned over a target plane in response to scanning signals includes a mask assembly for sensing the beam current at several different locations and providing a single beam current signal. The mask assembly includes a mask plate with sensing apertures and an annular Faraday cup aligned with the apertures for sensing beam current. The beam current signal is integrated over time to determine ion dose. A demultiplexer, in response to x and y scan signals, separates the beam current signal into separate signal components from each sensing aperture. Ion dose uniformity is determined by comparing the separate signal components, integrated over time, with an average value of the signal component.
Inventors:
KOORII FUIRITSUPU DEIIJUNIA
RANDOKUISUTO HOORU EMU
BURITSUKU ROBAATO BUI
RANDOKUISUTO HOORU EMU
BURITSUKU ROBAATO BUI
Application Number:
JP50288987A
Publication Date:
April 13, 1994
Filing Date:
April 27, 1987
Export Citation:
Assignee:
VARIAN ASSOCIATES
International Classes:
H01J37/04; H01J37/244; H01J37/317; H01L21/265; (IPC1-7): H01J37/04; H01J37/317; H01L21/265
Domestic Patent References:
| JP56089161B | ||||
| JPS57123639A | 1982-08-02 |
Attorney, Agent or Firm:
Sumio Takeuchi
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