Title:
【発明の名称】電子ビーム装置
Document Type and Number:
Japanese Patent JPH0740462
Kind Code:
B2
Abstract:
A device for recording or displaying images or for electron lithographic or electron microscopic uses, comprising in an evacuated envelope (1) a target (7) on which at least one electron beam (6) is focussed. This beam is generated by means of a semiconductor device (10) which comprises an electrically insulating layer (42) having an aperture (38) through which passes the beam. The said carries at least four beam-forming electrodes (43 up to and including 50) which are situated at regular intervals around the aperture (38), each of which electrodes has such a potential that an n-pole field or a combination of n-pole fields is generated in which n is an even integer greater than or equal to 4 and smaller than or equal to 16. A suitable choice of the n-pole field will make it possible to impart substantially any desired shape to the beam (6) and thus the focus on the target.
Inventors:
Altwool Marie Juhene Hoeheverichs
Heraldas Hehorius Petras Juan Holcombe
Heraldas Hehorius Petras Juan Holcombe
Application Number:
JP26398385A
Publication Date:
May 01, 1995
Filing Date:
November 26, 1985
Export Citation:
Assignee:
NB Phillipps Fleury Lempen Abuken
International Classes:
H01J1/308; H01J29/04; H01J3/02; H01J3/18; H01J29/48; (IPC1-7): H01J1/30
Domestic Patent References:
| JP5887731A |
Attorney, Agent or Firm:
Akihide Sugimura (1 outside)
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