Title:
【発明の名称】感光性組成物
Document Type and Number:
Japanese Patent JPH0782236
Kind Code:
B2
Abstract:
A photosensitive composition of this invention comprises: (a) a photosensitive diazo resin represented by the following general formula (I):wherein R1, R2 und R3 each represents a hydrogen atom, an alkyl or alkoxy group, R represents a hydrogen atom, an alkyl or phenyl group, X represents PF6 or BF4 and n represents a number of 1 to 200, in which a resin with the number n in the above formula being 5 or more is contained by more than 20 mol%,(b) an oleophilic high molecular compound with hydroxyl group and(c) a high molecular organic acid without hydroxyl group, and in which the content of the ingredient (c) is from 1.5 to 30% by weight based on the solid matter in said composition.The photosensitive composition of this invention can provide a photosensitive layer having high sensitivity and being excellent in storage stability and developability as well as excellent in the film strength.
Inventors:
TOMYASU HIROSHI
MAEDA YOSHIHIRO
GOTO SEI
SUZUKI NORIHITO
MAEDA YOSHIHIRO
GOTO SEI
SUZUKI NORIHITO
Application Number:
JP21267784A
Publication Date:
September 06, 1995
Filing Date:
October 12, 1984
Export Citation:
Assignee:
MITSUBISHI KAGAKU KK
KONIKA KK
KONIKA KK
International Classes:
G03C1/52; G03C1/54; G03C1/60; G03F7/016; G03F7/004; G03F7/021; G03F7/033; G03F7/038; (IPC1-7): G03F7/021; G03F7/004; G03F7/033
Domestic Patent References:
| JP5978340A | ||||
| JP56107238A |
Attorney, Agent or Firm:
Hiroshi Nakamoto (2 outside)
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