Title:
【発明の名称】X線リソグラフィー用マスクに用いるX線透過膜
Document Type and Number:
Japanese Patent JPH0828324
Kind Code:
B2
Abstract:
An X-ray permeable membrane for an X-ray lithographic mask consisting of an inorganic thin film obtained by the sputtering method using a target and consisting of silicon carbide and carbon, said target consisting of silicon carbide and carbon in a molar ratio of 99.9:0.1 to 70:30, having a transmission of at least 37% at a light wavelength of 633 nm and a tensile strength of 1x108 to 1x1010 dyn/cm2, and the membrane consisting of a silicon carbide constituted form silicon and carbon in a molar ratio in the range form 50.1:49.9 to 49.9:50.1.
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Inventors:
Shu Kashida
Yoshihiro Kubota
Aihiko Nagata
Noguchi Hitoshi
Yoshihiro Kubota
Aihiko Nagata
Noguchi Hitoshi
Application Number:
JP30047590A
Publication Date:
March 21, 1996
Filing Date:
November 06, 1990
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C23C14/06; C23C14/34; G03F1/22; H01L21/027; H01L21/30; (IPC1-7): H01L21/027; G03F1/16
Attorney, Agent or Firm:
Ryoichi Yamamoto (1 person outside)