Title:
【発明の名称】自己整合原位置エリプソメータおよびプロセス監視への使用方法
Document Type and Number:
Japanese Patent JPH08509810
Kind Code:
A
Abstract:
An ellipsometric measuring system is set-up in association with a vacuum chamber on a production line for thin film samples. The ellipsometer has a scanner for directing the incident light beam to different locations on a thin film sample, and the ellipsometer also has an aperture for limiting the reflected light beam received by the photodetector. The scanner implements a method of aligning the incident beam to a selected surface of the sample. The scanner and the aperture are used to provide a finer adjustment of the incident beam with respect to the selected surface. The ellipsometric measuring system further uses test thin film samples with known film thicknesses and index or refractions to calculate a value for the angle of incidence of the incident light beam.
More Like This:
Inventors:
Su, Young, Xiao Chung
De, Bora N.
Robison, Rodney El.
Yasar, Taglar
De, Bora N.
Robison, Rodney El.
Yasar, Taglar
Application Number:
JP52422494A
Publication Date:
October 15, 1996
Filing Date:
January 14, 1994
Export Citation:
Assignee:
Matrials Research Corporation
International Classes:
G01B11/06; G01J4/00; G01J4/04; G01N21/21; H01L21/66; (IPC1-7): G01B11/06; G01J4/00; G01N21/21
Attorney, Agent or Firm:
Akira Asamura (3 outside)