Title:
【発明の名称】エレクトロクロミック素材及びエレクトロクロミック装置ならびに製造方法
Document Type and Number:
Japanese Patent JPH10501847
Kind Code:
A
Abstract:
A process for manufacturing electrochromic layers/devices at high rates and low deposition temperatures is described. The method utilizes the magnetron enhanced sputtering technique in which a substrate (36) is rotated past sputter cathodes (38, 40, 42, 44, 46) and past a reactive ion source (48) in order to deposit a layered electrochromic device. The process uses high system pressure and large reaction gas flow rates, but relatively low reactive gas partial pressures at the sputter cathodes (38, 40, 42, 44, 46) to reproducibly form electrochromic materials and devices which exhibit excellent optical and physical properties.
Inventors:
O'Brien Nada A
Matthew John G H
Matthew Johnsee H
Ichiwa Bryan P
Allen Thomas H
Matthew John G H
Matthew Johnsee H
Ichiwa Bryan P
Allen Thomas H
Application Number:
JP50824195A
Publication Date:
February 17, 1998
Filing Date:
August 17, 1995
Export Citation:
Assignee:
Optical Coating Laboratory Inc.
International Classes:
C23C14/00; C23C14/08; C23C14/34; G02F1/1524; (IPC1-7): C23C14/34; C23C14/08; G02F1/15
Attorney, Agent or Firm:
Akihide Sugimura (6 others)