Title:
【発明の名称】リソグラフィ走査露光投影装置
Document Type and Number:
Japanese Patent JPH11507146
Kind Code:
A
Abstract:
A lithographic scanning exposure projection apparatus is provided with a radiation source (1) providing radiation pulses, a lens system (3, 7), a mask (5), imaged onto a substrate (9) and scanning apparatus (10) for scanning an image of an exit window (2) of the radiation source at a scanning speed over the substrate (9). A controller (13) controls both the energy of the radiation pulses and the scanning speed in dependence on the required exposure dose on the substrate and the repetition rate of the radiation pulses. The controller ensures maximum throughput of substrates through the apparatus and a minimum dose non-uniformity on the substrates.
Inventors:
Strawer Alexander
Dayager Ronald Andre Maria
Dayager Ronald Andre Maria
Application Number:
JP53508297A
Publication Date:
June 22, 1999
Filing Date:
March 25, 1997
Export Citation:
Assignee:
AS M Lithography Besloten Fennaught Shap
International Classes:
G03F7/20; G03F7/22; H01L21/027; (IPC1-7): G03F7/22; G03F7/20; H01L21/027
Attorney, Agent or Firm:
Akihide Sugimura (6 others)