Login| Sign Up| Help| Contact|

Patent Searching and Data


Document Type and Number:
Japanese Patent JPS4933639
Kind Code:
A
More Like This:
JPH10506207INDUSTRIAL APPLICABILITY The radiosensitive adduct having a diazonium cation, a fourth cation and a sulfonated polyester anion.
JP2973626RESIST COMPOSITION AND METHOD FOR PATTERNING USING THAT
JP2009062529ALKALI-SOLUBLE POLYMER AND RESIST COMPOSITION
Application Number:
JP7383672A
Publication Date:
March 28, 1974
Filing Date:
July 25, 1972
Export Citation:
Click for automatic bibliography generation   Help
International Classes:
G03F7/038; G03G15/05



 
Previous Patent: JPS4933638

Next Patent: 光情報記録媒体