Document Type and Number:
Japanese Patent JPS5037633
Kind Code:
A
Abstract:
1459626 Coincident photographic resist images SIEMENS AG 15 May 1974 [29 June 1973] 21442/74 Heading G2X A foil carrying identically imaged resist layers on either side, which images are in precise register with each other, is made by (i) applying a photosensitive resist layer to each side of the foil, (ii) forming a first photographic mask corresponding to the desired image, (iii) arranging said first mask on an unexposed photo-sensitive mask material in a reproducibly fixed position, exposing the said mask material through the first mask and developing to form a second photographic mask and (iv) placing the foil between the first and second photographic masks, bringing them into the reproducibly fixed position, exposing each photo-sensitive resist layer through a respective one of said masks and developing said exposed resist layers. The masks and foil may be held together by vacuum during exposure. The masks and sensitive materials are maintained in a reproducibly fixed position by placing in a vacuum contacting printing apparatus comprising a pair of frames Figs. 1 and 3 whose relative positions are determined by locating stop pins 11 on the frame shown in Fig. 3 against the stops 5 on the frame shown in Fig. 1. The assembled frames holding the masks and sensitive material are evacuated via tube 7, the vacuum being contained by the endless rubber seal 4.
Application Number:
JP7420374A
Publication Date:
April 08, 1975
Filing Date:
June 28, 1974
Export Citation:
International Classes:
C23F1/00; C23F1/02; G03F7/26; G03F9/00; (IPC1-7): C23F1/00; G03F7/00