Document Type and Number:
Japanese Patent JPS5185665
Kind Code:
A
Abstract:
In an electron beam apparatus corrections are made for vibrations and field disturbances which cause a lateral beam shift. A detector is arranged in an intermediate image near the beam path and a signal derived therefrom is used for controlling a beam deflection device. When a second beam deflection device is added, the undesired deflection in a scanning electron microscope can be distinguished from the deflection caused by the scanning.
Inventors:
KARERU YAN FUAN OOSUTORAMU
GERARUDASU GEGORIUSU PETORUSU
GERARUDASU GEGORIUSU PETORUSU
Application Number:
JP14904775A
Publication Date:
July 27, 1976
Filing Date:
December 13, 1975
Export Citation:
Assignee:
PHILIPS NV
International Classes:
G01Q20/02; G01Q30/04; H01J37/147; H01J37/244; (IPC1-7): H01J37/26