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Patent Searching and Data


Document Type and Number:
Japanese Patent JPS5516071
Kind Code:
B2
Abstract:
1493667 Ink jets INTERNATIONAL BUSINESS MACHINES CORP 27 Oct 1975 [31 Dec 1974] 43996/75 Heading B6P A nozzle structure for an ink jet includes a monocrystalline semi-conducting substrate 20 with an array of passages 21 (only one shown), and a layer 22 of uniform thickness overlying the substrate with orifices 23, each passage 21 is associated with an orifice 23 and their central axes are aligned. As shown a silicon substrate 20 receives a layer 22 (silicon dioxide or nitride) by vapour deposition, sputtering or thermal oxide growth. In step C a mask 35 is applied to control the anisotropic etching to produce passage 21 (step D). The orifice 23 can be produced by chemical/ sputter/ion/plasma etch through a mask 36.

Application Number:
JP15069375A
Publication Date:
April 28, 1980
Filing Date:
December 19, 1975
Export Citation:
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International Classes:
B26F1/26; B05B1/02; B41J2/16; G01D15/18; H04N1/034