Document Type and Number:
Japanese Patent JPS572373
Kind Code:
B2
Abstract:
A device for treating granular or lumpy material by passing a gaseous medium therethrough characterized by a chamber having a material discharge device at the lower end and a material supply device comprising a pair of coaxially arranged supply channels at the upper end. The chamber has either a gas inlet or a plurality of burners to provide a gas flow through a portion of the material in the chamber and the material being added through the supply channels which are each connected to separate gas discharge conduits so that the material being added to the chamber is subjected to a uniform treatment by the gaseous medium.
Application Number:
JP11601473A
Publication Date:
January 16, 1982
Filing Date:
October 17, 1973
Export Citation:
International Classes:
C04B7/44; B01J8/12; C04B2/02; C04B2/10; F27B1/20; F27B7/20; F27B17/00; F27B19/00; F27D13/00
Next Patent: BOILING WATER TYPE NUCLEAR REACTOR